Event

11th International Conference on Optic - Photonics Design & Fabrication

Date: November 28 (Wed) – 30 (Fri), 2018
Venue: International Conference Center Hiroshima
Details: 11th International Conference on Optic - Photonics Design & Fabrication
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Researchers from Fraunhofer Institute for Integrated Systems and Device Technology IISB, Fraunhofer Institute of Applied Optics and Precision Engineering IOF and Fraunhofer Institute for Photonic Microsystems IPMS will hold talks at ODF‘18, Hiroshima (11th International Conference on Optic - Photonics Design & Fabrication).

 

Nov.28 (Wed)

13:00-14:20 Optical Design / Simulation (2) 
Presiders: J. Heber (Fraunhofer / Germany)
13:25 Micro-optical Free-Forms: Design and Fabrication 
U. Zeitner (Fraunhofer Inst. of Applied Optics and Precision Engineering Jena / Germany, Friedrich-Schiller-Univ. Jena / Germany), P. Schleicher (Fraunhofer Inst. of Applied Optics and Precision Engineering Jena / Germany), R. Leitel, and D. Michaelis (Fraunhofer Inst. of Applied Optics and Precision Engineering Jena / Germany)

13:50 Spatial Beam Shaping in Amplitude and Phase for Multispectral Applications Using Binary Amplitude Modulators and Phase Masks
J. Heber (Fraunhofer Inst. for Photonic Microsystems / Germany)

Nov. 30 (Fri)
8:50-10:40 Optical Components / Devices (2) 
9:15 Understanding and Optimization of Imaging for EUV Lithography 
A. Erdmann (Fraunhofer Inst. for Integrated Systems and Device Technology / Germany)

A. Tuennermann and K. Fuechsel from Fraunhofer IOF and J. Heber from Fraunofer IPMS are the members of the committee.