ISPlasma2010

Date & Time: March 7-10, 2010
Venue: Meijo University, Nagoya
Fee: Early Registration (before Jan.31, 2010) General: 15,000 Yen, Student: 3,000 Yen
Late Registration (until Feb.28, 2010) General: 20,000 Yen, Student: 5,000 Yen
Banquet fee (on March 09, 2010) General: 5,000 Yen, Student: 2,000 Yen

The ISPlasma, the International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, is held as part of the Expansion Program of the Second Stage Knowledge Cluster Initiative (Tokai Region Nanotechnology Manufacturing Cluster) to establish an Advanced Plasma Nanotechnology Science Research Foundation in the Tokai region. The symposium will include invited lectures, selected oral / poster presentations and panel discussions.
Prof. Schultheiss, head of the Fraunhofer Institute for Electron and Plasma Technology FEP will take part in the Panel Discussion "Application Front of Advanced Plasma Science and Industry-Academia-Government Collaboration" on March 10th.

<SCHEDULE AT A GLANCE> *please download the detailed program
- March 07 -
Welcome Party at Student Hall in Meijo University

- March 08 -

Opening
Technical Session
Poster Session

- March 09 -
Technical Session
Panel Discussion "Application of Advanced Plasma Technology for Nitride Semiconductors"
Poster Session
Banquet at Meijo Cafeteria in Meijo Univ.

- March 10 - Technical Session
Panel Discussion "Application Front of Advanced Plasma Science and Industry-Academia-Government Collaboration"
Poster Session
Closing

http://www.isplasma.jp/english/16.html

Secretariat for ISPlasma2010:

c/o Aichi Science & Technology Foundation

Phone: +81 52 23 1656

Fax: +81 52 231 1640

E-mail: isplasma@astf.or.jp