Date & Time: March 7-10, 2010
Venue: Meijo University, Nagoya
Fee: Early Registration (before Jan.31, 2010) General: 15,000 Yen, Student: 3,000 Yen
Late Registration (until Feb.28, 2010) General: 20,000 Yen, Student: 5,000 Yen
Banquet fee (on March 09, 2010) General: 5,000 Yen, Student: 2,000 Yen
The ISPlasma, the International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, is held as part of the Expansion Program of the Second Stage Knowledge Cluster Initiative (Tokai Region Nanotechnology Manufacturing Cluster) to establish an Advanced Plasma Nanotechnology Science Research Foundation in the Tokai region. The symposium will include invited lectures, selected oral / poster presentations and panel discussions.
Prof. Schultheiss, head of the Fraunhofer Institute for Electron and Plasma Technology FEP will take part in the Panel Discussion "Application Front of Advanced Plasma Science and Industry-Academia-Government Collaboration" on March 10th.
<SCHEDULE AT A GLANCE> *please download the detailed program
- March 07 -
Welcome Party at Student Hall in Meijo University
- March 08 -
- March 09 -
Panel Discussion "Application of Advanced Plasma Technology for Nitride Semiconductors"
Banquet at Meijo Cafeteria in Meijo Univ.
- March 10 - Technical Session
Panel Discussion "Application Front of Advanced Plasma Science and Industry-Academia-Government Collaboration"
Secretariat for ISPlasma2010:
c/o Aichi Science & Technology Foundation
Phone: +81 52 23 1656
Fax: +81 52 231 1640